Crystal Optics

Capabilities and Services Includes:

  1. Designing crystal optics (e.g., monochromators consisting of multiple crystals, analyzers, high-energy Laue crystals, phase plates, polarizers, etc) using X-ray dynamical-theory calculations (particularly using the in-house HXRD software) and modeling to achieve desired resolution, efficiency, acceptance, polarization, etc.
  2. Fabricating (and refurbishing) ultrahigh-quality crystal optics (Si, Ge, quartz, sapphire, diamond), from precise orienting, cutting/dicing, grinding, and etching to strain-free polishing, including channel-cut crystal polishing.
  3. X-ray characterization and testing of crystal optics using X-ray topography and double-crystal rocking curve imaging.
  4. Determination of orientation of any crystals using the Laue camera and the in-house LauePt  simulation program, with precision better than 0.05°.
  5. High-precision cutting/dicing of crystals, wafers, sample holders, fixtures, instrument parts etc.
  6. Polishing of high-precision instrument parts (including metals, ceramics, etc).

Work requests can be submitted by filling the Optics Group's work request from. Please make the crystal optics requests in the category of "Fabrication of Crystal Optics/Chemical Etching".

The crystal optics facilities are described below.

                           ​

 
Dicing/Cutting Laboratory (COF2) 

The lab is equipped with: (1) Two dicing saws for precisely and delicately cutting relatively thin wafers and plates into distinct pieces; (2) Two diamond-wire saws for cutting/slicing crystal boules of Si and Ge up to 8 inches in diameter and length. The diamond-wire saw cuts crystals gently with low strains/damages and minimal loss of valuable material; (3) A fast Blanchard surface grinder.

 

 
  
Optics Machining Shop (COF4) 

This lab is equipped with (1) two high-precision surface grinders, (2) a rotary diamond blade saw for cutting large crystal boules, (3) a hole drilling machine, (4) lapping machines, and many other machining equipment.

 
  
Etching Laboratory (Bldg. 401/L0104) 

This facility is used to etch crystals using wet chemical methods (mainly HF and HNO3) to remove surface layers that have stresses/strains/damages induced by machining processes.

 

 
  
Polishing Lab (COF3) 
The Polishing Laboratory utilizes the following lappers/polishers (in addition to various small polishers and lappers): 
  
Hyprez LM28 Lapping Machine (Engis) 
This machine is used for the planarization and thinning of optical components up to 300mm diameter on a hard pad or composite copper lapping plate.
 
  
  
Strasbaugh 6DF-1 Precision Polishmaster Qty 2 

This versatile overarm polisher can be outfitted with various plates and pads to perform intermediate and fine polishing steps using diamond or colloidal silica slurries.

•    A novel homemade automated machine for polishing channel-cut crystals, Channel-Cut High Resolution Polisher (C-CHiRP).

This new homemade instrument can be used for machine-polishing channel-cut crystal surfaces or other special-shaped crystal surfaces that do not have top flat surfaces (so that normal polishers cannot polish them). It can achieve strain-free channel-cut walls with roughness also toward 1Å. "

 
  
Inspection Equipment 
The Fabrication Laboratory is equipped with a DIC microscope for immediate inspection during the polishing process. Optics requiring more detailed inspection and accurate measurements are sent to the Metorology Laboratory.  
  
X-ray Laboratory (Bldg. 401/L0111 and 401/L0120) 

This laboratory is equipped with three main instruments:

  1. Two-axis Rigaku diffractometer (with Cu or Mo x-ray tube) for precisely orienting single crystals along required lattice planes with precision ≤0.05°.
  2. Back-reflection Laue camera (with Cu or Mo x-ray tube) for identification/verification of crystal orientations, equipped with the LauePt simulation software for studying the orientations of any single crystals with high precision up to 0.1°.
  3. Topo Unit, consisting of 18kW rotating-anode X-ray generator and a double-crystal diffractometer, can measure high-resolution (strain sensitivity better than 10-6), double-crystal rocking curves of silicon, germanium, diamond, etc. Can take topography images with a CCD detector on each point of the rocking curve (Rocking Curve Imaging). The X-ray beam size can be up to four inches in diameter, allowing to reveal macroscopic strains of large crystals (including X-ray monochromators mounted on fixtures).

"

Advanced X-ray characterization of crystal optics is carried out at the 1-BM Optics and Detectors Test Beamline.

 
  
Crystal Optics Research and Development 

R&D in crystal optics is carried out either independently, or jointly with the APS beamline scientists and user community, or in collaboration with other facilities to keep the group at the state-of-the art in x-ray optics. Examples include designing and development of high-to ultrahigh- resolution crystal monochromators and analyzers (from sub-10 meV to sub-meV) for IXS/RIXS, strain-free crystal polishing with roughness toward 1A, automated machine polishing of channel-cut crystals, quartz-based X-ray optics, diamond optics, SiC optics, etc.

"

 
Development of novel sub-10-meV RIXS system with a flat quartz analyzer (in collaboration with IXN Group, Kim et al., Scientific Reports 8, 1598 (2018).