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Ultra-stable oven designed for x-ray reflectometry and ellipsometry studies of liquid surfaces

Brown M, Uran S, Law B, Marschand L, Lurio L, Kuzmenko I, Gog T

75 (8): 2536-2540 AUG 2004
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Stable temperature control is highly desirable for reflectivity studies of binary liquid mixtures. In this article we report on the construction of an oven that possesses good temperature stability (similar to1 mK/day) and small transverse temperature gradients (<1 mK/cm). The oven has a horizontal geometry and can be used for either x-ray reflectometry or ellipsometry measurements from the liquid/vapor surfaces of such systems. Details of the oven design together with test results are provided. (C) 2004 American Institute of Physics.

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