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Small angle x-ray scattering for sub-100 nm pattern characterization

Jones RL, Hu T, Lin EK, Wu WL, Kolb R, Casa DM, Bolton PJ, Barclay GG

83 (19): 4059-4061 NOV 10 2003
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Characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using small angle x-ray scattering. The transmission scattering geometry employed potentially enables high throughput measurements for future technology nodes of the semiconductor industry, organic and inorganic nanoscale devices, and three-dimensional structures. The method is demonstrated through the characterization of a series of polymer photoresist gratings using a synchrotron x-ray source. Quantities, such as periodicity and line width, are extracted using minimal modeling. Additional quantities and the potential of a laboratory-based x-ray system are briefly discussed. (C) 2003 American Institute of Physics.

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