Printable Version | View in New Window | Update Beamline Info

Beamline 1-ID-B,C,E: High-energy X-ray Scattering

X-ray Science Division, APS
Materials Science, Physics, Chemistry

Description

1-ID is a dedicated high-energy x-ray scattering beamline operating in the 50-130 keV range. The x-ray optics are optimized for high-energy x-ray usage and high-energy resolution, and several focusing modes are available. Supported high-energy techniques include macroscopic stress/texture determination, single-grain diffraction microscopy (HEDM), pair-distribution function measurements, powder diffraction, and small-angle scattering. Support for various in-situ environments is available including thermo-mechanical deformation.

 

Supported Techniques

  • High-energy x-ray diffraction
  • Radiography
  • Small-angle x-ray scattering
  • Fluorescence spectroscopy
  • Pair distribution function

Beamline Controls and Data Acquisition

The beamline is run by Linux workstations and VME-based electronics. The VME-based equipment is controlled by EPICS. There are several software clients that use EPICS including MEDM, SPEC and Python. Other computers, such as PCs, are used to run specialized pieces of equipment (e.g., area detectors). FPGAs and associated code (SoftGlue) used for detector-motion synchronization in high-demand applications.

Detectors

  • NaI scintillation
  • Ionization chambers
  • Ge & Si solid state detectors
  • ScintX CCD (SAXS)
  • Retiga CCDs (HR imaging/diffraction)
  • GE amorphous Si area detectors

Additional Equipment

  • 6-circle diffractometer
  • Optical tables
  • Various motorized stages
  • MTS servo-hydraulic fatigue device
  • Infrared furnace (1200 C)

Local Contacts

Name JON ALMER (WAXS/SAXS)
Phone 630.252.1049
Name SARVJIT D. SHASTRI (Optics/Resonant scattering)
Phone 630.252.0129
Name PETER KENESEI (3DXRD/Imaging)
Phone 630.252.0133
Name JOHN S. OKASINSKI (WAXS/Chemistry)
Phone 630.252.0162
Name JUN-SANG PARK (WAXS/Strain)
Phone 630.252.9194

Beamline Specs

Source (upstream)

3.3 Undulator (Undulator A)

Source (downstream)

2.3 Undulator

Monochromator Type

Si(111) Bent Double-Laue

Energy Range

50-150 keV

Resolution (ΔE/E)

1.5 x 10 -3

Flux (photons/sec)

1 x 1012 @80 keV

Beam Size (HxV)

Focused

1000µm x 2µm

Unfocused

1mm x 1mm

Monochromator Type

High-resolution Mono

Energy Range

50-90 keV

Resolution (ΔE/E)

1 x 10 -4

Flux (photons/sec)

7 x 1010 @80 keV

Beam Size (HxV)

Focused

1000µm x 5µm

Unfocused

1mm x .5mm

For additional information see:
http://www.aps.anl.gov/Sector1/

Current Status:

Operational/Accepting General Users

Access Mode:

On-site